Advances in Chemical Vapor Deposition

by | Sep 22, 2017

A new Special Issue entitled "Advances in Chemical Vapor Deposition" is published in Advanced Materials Interfaces in recognition of Professor Michael L. Hitchman

Guest edited by Francis Maury, Sergey Alexandrov, Davide Barreca, Dimitris Davazoglou, and Martyn Pemble, “Advances in Chemical Vapor Deposition” are highlighted in Issue 18 in Advanced Materials Interfaces. This Special Issue includes one Review, three Communications, and thirteen Full Papers covering topics ranging from microelectronics to photovoltaics, including optical and electro-optical systems, integration issues, flexible devices, photocatalysis, and photoelectron catalysis. These articles reflect the full breadth and diversity of recent developments in various vapor deposition techniques.

The Issue is dedicated to Professor Michael L. Hitchman who also contributed a comment as part of the Editorial.

Find the comprehensive collection of articles below:

Editorial by Francis Maury, Sergey Alexandrov, Davide Barecca, Dimitris Davazoglou, and Martyn Pemble

Review Atomic Layer Deposition for Graphene Device Integration by R. H. J. Vervuurt, W. M. M. (Erwin) Kessels, and A. A. Bol

Nanostructured CaF2:Ln3+ (Ln3+ = Yb3+/Er3+, Yb3+/Tm3+) Thin Films: MOCVD Fabrication and Their Upconversion Properties by A. L. Pellegrino, P. Cortelletti, M. Pedroni, A. Speghini, and G. Malandrino

Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD by D. J. Hagen, J. Connolly, I. M. Povey, S. Rushworth, and M. E. Pemble

Atomic Layer Deposition Enabled Perovskite/PEDOT Solar Cells in a Regular n–i–p Architectural Design by D. Koushik, W. J. H. Verhees, D. Zhang, Y. Kuang, S. Veenstra, M. Creatore, and R. E. I. Schropp


Nanostructured Fe2O3 Processing via Water-Assisted ALD and Low- Temperature CVD from a Versatile Iron Ketoiminate Precursor by D. Peeters, A. Sadlo, K. Lowjaga, O. Mendoza Reyes, L. Wang, L. Mai, M. Gebhard, D. Rogalla, H.-W. Becker, I. Giner, G. Grundmeier, D. Mitoraj, M. Grafen, A. Ostendorf, R. Beranek, and A. Devi

Correlation of Optical Properties, Electronic Structure, and Photocatalytic Activity in Nanostructured Tungsten Oxide by M. Ling, C. S. Blackman, R. G. Palgrave, C. Sotelo-Vazquez, A. Kafizas, and I. P. Parkin

Vapor Phase Fabrication of Nanoheterostructures Based on ZnO for Photoelectrochemical Water Splitting by D. Barreca, G. Carraro, A. Gasparotto, C. Maccato, T. Altantzis, C. Sada, K. Kaunisto, T.-P. Ruoko, and S. Bals


Hot-Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry by A. Y. Kovalgin, M. Yang, S. Banerjee, R. O. Apaydin, A. A. I. Aarnink, S. Kinge, and R. A. M. Wolters

Combined Macro/Nanoscale Investigation of the Chemical Vapor Deposition of Fe from Fe(CO)5 by I. G. Aviziotis, T. Duguet, C. Vahlas, and A. G. Boudouvis

Low Temperature Epitaxial Barium Titanate Thin Film Growth in High Vacuum CVD by M. Reinke, Y. Kuzminykh, F. Eltes, S. Abel, T. LaGrange, A. Neels, J. Fompeyrine, and P. Hoffmann

Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low-Temperature Film Growth by M. Mattinen, T. Hatanpää, T. Sarnet, K. Mizohata, K. Meinander, P. J. King, L. Khriachtchev, J. Räisänen, M. Ritala, and M. Leskelä

Reversible and Irreversible Reactions of Trimethylaluminum with Common Organic Functional Groups as a Model for Molecular Layer Deposition and Vapor Phase Infiltration by F. Yang, J. Brede, H. Ablat, M. Abadia, L. Zhang, C. Rogero, S. D. Elliott, and M. Knez

Exploiting the Properties of Ti-Doped CVD-Grown Diamonds for the Assembling of Electrodes by E. Tamburri,* R. Carcione, F. Vitale, A. Valguarnera, S. Macis, M. Lucci, and M. L. Terranova

Low-Temperature Thermal CVD of Superblack Carbon Nanotube Coatings by H. J. Basheer, C. Pachot, U. Lafont, X. Devaux, and N. Bahlawane


Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing by J. Zhao, M. Wang, and K. K. Gleason

Improved Stability of Polymer Solar Cells in Ambient Air via Atomic Layer Deposition of Ultrathin Dielectric Layers by E. Polydorou, M. A. Botzakaki, I. Sakellis, A. Soultati, A. Kaltzoglou, T. A. Papadopoulos, J. Briscoe, C. Drivas, K. Seintis, M. Fakis, L. C. Palilis, S. N. Georga, C. A. Krontiras, S. Kennou, P. Falaras, N. Boukos, D. Davazoglou, P. Argitis, and M. Vasilopoulou

Low-Temperature Atmospheric Pressure Plasma-Enhanced CVD of Nanocomposite Coatings “Molybdenum Disulfide (Filler)–Silicon Oxide (Matrix)” by S. E. Alexandrov, K. S. Tyurikov, D. A. Kirilenko, A. V. Redkov, A. A. Lipovskii

ASN Weekly

Sign up for our weekly newsletter and receive the latest science news.

Related posts: